< BK21+ BEST Seminar Series Announcement> 

Time and Date : 16:00 ~ 17:00 Tuesday 09/18/2018

Place : D406, Engineering Building #4

Title : New Opportunities in Applications of Atomic Layer Deposition Films

Abstract:

As the individual feature size of the electronic device rapidly shrinks, i.e., the packing density increases, nowadays, the need for high-quality thin film deposition techniques are increasing. Among various thin film deposition techniques, atomic layer deposition (ALD) offers unique characteristics that make itself suitable for fabricating high-quality ultra-thin films. Due to its self-limiting surface reaction mechanism, ALD can deposit extremely uniform thin films conformally over high-aspect-ratio structured surfaces with sub-nm-level thickness control. The thermal damage of the underlying device can also be minimized due to the low process temperature (<400℃) during ALD. Furthermore, plasma-enhanced ALD (PEALD), which utilizes highly reactive plasma species such as radicals or ions, offers greater process flexibility and a wider selection of materials than conventional thermal ALD. The use of plasma in PEALD greatly enhances the film crystallinity that can be crucial in device performance. Therefore, ALD and PEALD are providing new research ideas and engineering innovations in a variety of areas such as electronic devices, energy conversion devices, and functional coatings.

In this talk, recent research activities in Energy Nano-Tech Reseach (ENTeR) lab at SeoulTech regarding the design and manufacturing of ALD/PEALD systems/processes will be presented. Also the investigation on the non-conventional application examples of ALD films in the areas of mechanical (tribological and thermal) coating, energy conversion device (thin film solid oxide fuel cell), and information storage device (dynamic random access memory) will be discussed. The correlation between ALD process parameters and film performances in these applications will be elucidated, which may provide new ideas on wider applications of ALD films.

Presenter: Ji-Hwan Ahn, Professor / Seoul National University of Science and Technology

Host: Prof. Kim, Hyung-Jun, Yonsei EEE